Symposium

Symposium A-7:
Environmental Friendly Technologies for Thin Film Growth

Organizers:

Representative
  • Naoto OHTAKE
Tokyo Institute of Technlogy
Co-Organizers
  • Hidetoshi SAITO
Nagaoka University of Technology
Correspondence
  • Naoto OHTAKE
Tokyo Institute of Technlogy ohtaken@mech.titech.ac.jp

Scope:

Thin films technology provides an attractive alternative for semiconductors, mechanical components, sensors, actuators, optical components in next generation. In addition to traditional coating methods, there are many environmental friendly deposition systems and products that have been envisioned and are currently under active research. These include, for example, atmospheric plasma CVD, low emission deposition and etching process, environmental friendly wet process, energy saving deposition process, fabrication of photovoltaic cells, thin films technology for fuel cells and Li ion batteries, fabrication of environmental friendly thin films such as diamond-like carbon, c-BN, a-CN, etc.
All of these require thin films production as enabling technology for film design and deposition process with unsurpassed functionality and quality. Environmental Friendly Technologies for Thin Film Growth thus presents many challenges and opportunities to researchers from academia and industry alike.

Topics:

Specific topics of interest include, but are not limited to:

  • Atmospheric plasma and atmospheric plasma CVD
  • Low emission deposition and etching process
  • Environmental friendly wet process
  • Energy saving deposition process
  • Fabrication process of photovoltaic cells
  • Thin films technology for fuel cells and Li ion batteries
  • Fabrication of environmental friendly thin films (DLC, c-BN, a-CN, etc.)
  • Safety issues in thin films technology
  • Call for Paper
  • Call for Exhibitions
  • Call for Paper