Organizers:

Representative

Hiroshi AMEKURA	National Institute for Materials Science

Co-Organizers

Komei BABA	Industrial Technology Center of Nagasaki
Akiyoshi CHAYAHARA	National Institute of Advanced Industrial Science and Technology
Hisayoshi ITOH	Japan Atomic Energy Agency
Naoki KISHIMOTO	National Institute for Materials Science
Yoshiaki SUZUKI	RIKEN
Masami IKEYAMA	National Institute of Advanced Industrial Science and Technology
Hiroshi TSUJI	Kyoto University
Paul K CHU	City University of Hong Kong
Wolfgang ENSINGER	Darmstadt University of Technology
Daryush ILA	Fayetteville State University
Won-Kook CHOI	Korea Institute of Science and Technology

Correspondence

Takaaki AOKI	Kyoto University	aoki@sakura.nucleng.kyoto-u.ac.jp

Scope:

Ion beam technology has, for half a century, made a significant contribution to the progress of science and industry such as electronics, photonics, machine industry, etc., through the synthesis of advanced materials, the modification of surface properties of materials, the modification of surface morphology and texture. Recently, it has been required to develop the energy saving system, processes and devices, high efficient energy utilization ones and the low environmental load ones, from the view point of the global environmental problems, and therefore to develop advanced materials which underlie these systems, processes and devices. It is expected that ion beam technology plays an important role for the production of advanced materials. This session will address the challenges associated with innovative material technologies that utilize ion beam. Specifically, papers that focus on the ion-beam synthesis of advanced materials as well as new utilization techniques of ion beam are encouraged. We are looking forward to having broad, interdisciplinary discussions that will lead to breakthrough in materials science.

Topics:

• Fundamentals of ion-solid interaction
• Nanostructure synthesis and modification
• Ion-driven self-organization, nanopatterning
• Defect-induced modification of materials
• Ultra-low energy implantation
• Focused ion beams, ion lithography
• Cluster ions, single ion, swift heavy ions, highly charged ions
• Plasma immersion, plasma-induced modification
• Modification of semiconductors, metals and ceramics
• Application to electronic, magnetic and optical materials
• Irradiation effects in insulators and nuclear materials
• Modification of polymers and biomaterials

Invited Speakers:

John BAGLIN	IBM

Lecture title: Nanoscale Patterning by Ion Beam Lithography Coupled with Guided Self-Assembly

Hiroshi IMAYA	Riken Keiki Co., Ltd.

Lecture title: Improvement of properties of electrochemical gas sensors by ion implantation into the gas permeable membranes

Milko JAKSIC	Ruder Boskovic Institute

Lecture title: Ordering of nanostructures using MeV heavy ion microbeams

Teruyuki KITAGAWA	Nomulra Plating Co., Ltd.

Lecture title: Novel carbonaceous film with high electrical conductivity and ultra high hardness

Giovanni MARLETTA	University of Catania

Lecture title: "Smart" Biocompatible Surfaces by Ion Beams

Jeffrey McCALLUM	University of Melbourne

Lecture title: Single Ion Implantation for Quantum Device Fabrication

Takeshi OHSHIMA	Japan Atomic Energy Agency

Lecture title: Creation of Nitrogen-Vacancy Centers in Diamonds by Nitrogen Ion Implantation

Giancarlo RIZZA	ÉCOLE POLYTECHNIQUE

Lecture title: Beyond the ion-beam shaping mechanism toward plasmonic applications

Manabu TANAKA	Tokyo Metropolitan University

Lecture title: Conductivity of Electrospun Polymer Nanofibers by Ion-irradiation

Jim WILLIAMS	Australian National University

Lecture title: Ion-Implanted Defects： Their Potential for Luminescent Devices in Silicon