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The 25th Annual Meeting of MRS-J Program List: Oral

C-5 : Frontier of Nano-Materials Based on Advanced Plasma Technologies

Entry No Keynote/
Presentation Date Time to
Time to
Award Presenter Name Affiliation Paper Title
Dec. 8
13:00 - 17:15
横浜市開港記念会館/ Room C
Yokohama Port Opening Plaza/ Room C
Chair :
近藤 博基 (名古屋大学)
Hiroki KONDO (Nagoya Univ.)
2417   Keynote   C5-K8-001 Dec. 8 13:00 13:30 Tomohiro NOZAKI Tokyo Institute of Technology Greenhouse gas utilization by renewable electricity
2762   Invited   C5-I8-002 Dec. 8 13:30 14:00 Sven STAUSS Department of Advanced Materials, Graduate School of Frontier Sciences, The University of Tokyo Surface dielectric barrier discharges in supercritical CO2 and their application to deposition processes
2666     C5-O8-003 Dec. 8 14:00 14:15 Tatsuo ISHIJIMA Kanazawa University Production of Microwave Excited Bubble Plasma in Water at Low Microwave Power Injection
2676     C5-O8-004 Dec. 8 14:15 14:30 Tatsuru SHIRAFUJI Graduate School of Engineering, Osaka City University Gold Nanoparticle Synthesis Using Solution Plasma Generated in Micro Fluidic Arrays
2306   Invited   C5-I8-005 Dec. 8 14:30 15:00 *G Hyunwoong SEO Kyushu University Photovoltaic potentials of nano-particles based on advanced plasma processes
   Break Dec. 8 15:00 15:15
Chair :
白藤 立 (大阪市立大学)
Tatsuru SHIRAFUJI (Osaka City Univ.)
2700   Invited   C5-I8-006 Dec. 8 15:15 15:45 Hirok KONDO Nagoya University Advanced Plasma Synthesis of carbon nanomaterials for green energy applications
2075   Keynote   C5-K8-007 Dec. 8 15:45 16:15 Chao-sung LAI Chang Gung University Low damage fluorographene dielectrics for graphene transistor
2722   Invited   C5-I8-008 Dec. 8 16:15 16:45 Heeyeop CHAE Sungkyunkwan University (SKKU) Multivariate Analysis Techniques for Plasma Monitoring of Etching Processes
2892   Invited   C5-I8-009 Dec. 8 16:45 17:15 Jean-paul BOOTH LPP-CNRS, Ecole Polytechnique Quantitative Diagnostics of Inductive Plasmas in Chlorine, Oxygen and Chlorine-Oxygen Mixtures
Dec. 9
9:30 - 12:00
横浜市開港記念会館/ Room C
Yokohama Port Opening Plaza/ Room C
Chair :
柳生 義人 (佐世保工業高等専門学校)
Yoshihito YAGYU (National Institute of Technology, Sasebo College)
2425   Keynote   C5-K9-001 Dec. 9 09:30 10:00 Koichi SASAKI Division of Quantum Science and Engineering, Hokkaido University Analysis of magnetron sputtering deposition processes of Cu2ZnSnS4 thin films
2246     C5-O9-002 Dec. 9 10:00 10:15 *M Katsuhiro HATTORI Faculty of Science and Technology, University of Meijo Heating mechanisms of substrate temperature in high-power impulse magnetron sputtering
2553     C5-O9-003 Dec. 9 10:15 10:30 Jaeho KIM National Institute of Advanced Industrial Science and Technology (AIST) Production of a 50-mm-wide atmospheric pressure plasma jet for materials processing
2704   Invited   C5-I9-004 Dec. 9 10:30 11:00 Toshiyuki KAWASAKI Faculty of Enginnering, Nippon Bunri University Detection of Reactive Oxygen Species Generated by Non-thermal Plasma Jet using Iodine-starch Reactions
2701   Invited   C5-I9-005 Dec. 9 11:00 11:30 Jun-seok OH School of Systems Engineering, Kochi University of Technology/Center for Nanotechnology, Research Institute of KUT UV-VIS Absorption Spectroscopy for Plasma Medicine
2541   Invited   C5-I9-006 Dec. 9 11:30 12:00 Keisuke TAKASHIMA Department of Electronic Engineering, Tohoku University Measurements of Reactive Species Controlled by Wet-Air Plasma Jet Using AC High Voltage and Nanosecond Pulses
Dec. 9
13:00 - 15:30
横浜市開港記念会館/ Room C
Yokohama Port Opening Plaza/ Room C
Chair :
高島 圭介 (東北大学)
Keisuke TAKASHIMA (Tohoku Univ.)
2926     C5-O9-007 Dec. 9 13:00 13:15 *M Ryoma YASUI The University of Tokyo Laser diagnostics on atmospheric-pressure helium pulsed and dielectric barrier discharges at room- and cryogenic-temperatures
2830     C5-O9-008 Dec. 9 13:15 13:30 Giichiro UCHIDA Joining and Welding Research Institute, Osaka University Control of discharge characteristics of a plasma jet by ambient gas-flow conditions
2314   Invited   C5-I9-009 Dec. 9 13:30 14:00 Satoshi UCHIDA Graduate School of Science and Engineering, Tokyo Metropolitan University Numerical Modeling of Interface between Discharge Plasma and Biological Objects
2529     C5-O9-010 Dec. 9 14:00 14:15 *G Yoshihito YAGYU National Institute of Technology, Sasebo College The Primary Results of Gene Expression by DNA Microarray Analysis on Yeast, Saccharomyces cerevisiae, after FE-DBD Plasma Exposure
2810     C5-O9-011 Dec. 9 14:15 14:30 *G Toshihiro TAKAMATSU Department of Gastroenterology, Kobe University /Department of Energy Sciences, Tokyo Institute of Technology Development of atmospheric non-thermal mini-plasma jet created by a 3D printer
2218   Invited   C5-I9-012 Dec. 9 14:30 15:00 Takahiro ISHZIAKI Shibaura Institute of Technology/JST-CREST Synthesis of heteroatom-containing carbon materials by solution plasma
2654     C5-O9-013 Dec. 9 15:00 15:15 *M Mardiansyah MARDIS Department of Chemical Engineering, Nagoya University Synthesis of Au, Ag and Ti Nanoparticles by Pulsed Laser Ablation in Pressurized CO2
2689     C5-O9-014 Dec. 9 15:15 15:30 *M Shinnosuke TAKAI Nagoya University Low-temperature Growth of InN Films on Si(111) Substrates by Radical-Enhanced Metal-Organic Chemical Vapor Deposition
Dec. 10
9:30 - 12:00
横浜市開港記念会館/ Room C
Yokohama Port Opening Plaza/ Room C
Chair :
内田 儀一郎 (大阪大学)
Giichiro UCHIDA (Osaka Univ.)
2758   Keynote   C5-K10-001 Dec. 10 09:30 10:00 Makoto KAMBARA Dept of Materials Engineering, The University of Tokyo Nanocomposite Si/SiOx particle formation through enhanced disproportionation reaction during plasma spray PVD
2373   Invited   C5-I10-002 Dec. 10 10:00 10:30 Masaya SHIGETA Joining and Welding Research Institute, Osaka University Modelling of collective formation of nanoparticles transported with a thermal plasma jet
2744     C5-O10-003 Dec. 10 10:30 10:45 *M Chihiro TAKESHITA Graduate School of Engineering, Kyoto University Silicon Nanowire Growth on Si and SiO2 Substrates by Plasma Sputtering
2286     C5-O10-004 Dec. 10 10:45 11:00 *M Reito NAGAI Department of Electronic Engineering, Tohoku University Mild Plasma Treatment for Modulation of Optoelectrical Property of Few-Layer Tungsten Diselenide
2594     C5-O10-005 Dec. 10 11:00 11:15 Yasushi INOUE Faculty of Engineering, Chiba Institute of Technology/Graduate School of Engineering, Chiba Institute of Technology Electrochromic Durability of ITO-coated InN Films with Isolated Nanocolumnar Structure
2778     C5-O10-006 Dec. 10 11:15 11:30 *M Masakazu TOMATSU Graduate School of Science and Engineering, University of Meijo Etching of Carbon Nanowalls/SiO2 for the Fabrication of Antireflective Nanostructures
2775   Invited   C5-I10-007 Dec. 10 11:30 12:00 Satomi TAJIMA Nagoya University Controlling surface morphology of Si related materials using F2 and NOx gases