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The 28th Annual Meeting of MRS-J Program List: Oral

C-3:Frontier of Nano-Materials Based on Advanced Plasma Technologies

Entry No Keynote/
Invited		 Presentation Date Time to
start		 Time to
finish		 Award Presenter Name Affiliation Paper Title
Dec. 18
9:00 - 11:40
北九州国際会議場　21会議室C,D （D会場）
Kitakyushu International Conference Center Room 21C,D
Chair :
布村 正太 (産業技術総合研究所)
Shota NUNOMURA (National Institute of Advanced Industrial
Science and Technology
2966   Keynote   C3-K18-001 Dec. 18 09:00 09:35 Kwang-Ryeol Lee Korea Institute of Science and Technology Computational Research of Surface Phenomena
2493   Keynote   C3-K18-002 Dec. 18 09:35 10:10 Osamu SAKAI The University of Shiga Prefecture Weblike Network in Plasma Chemistry and Its Understanding for Plasma Nanomaterial Science
3024   Invited   C3-I18-003 Dec. 18 10:10 10:35 Daisuke IKEDA Faculty of Information Science and Electrical Engineering Text Mining with Variety and Frequency
   Break Dec. 18 10:35 10:50
2695   Invited   C3-I18-004 Dec. 18 10:50 11:15 *G Kunihiro KAMATAKI Graduate School of Information Science and Electrical Engineering, Kyushu University Effects of Plasma Fluctuation on Size Dispersion of Nano-Particles in Reactive Plasma
2758   Invited   C3-I18-005 Dec. 18 11:15 11:40 Kentaro TOMITA Interdisciplinary Graduate School of Engineering Sciences, Kyushu University In-situ plasma diagnostics using optically-trapped fine particles
Dec. 18
14:15 - 16:05
北九州国際会議場　21会議室C,D （D会場）
Kitakyushu International Conference Center Room 21C,D
Chair :
伊藤 昌文 (名城大学)
Masafumi ITO (Meijo University)
2192   Keynote   C3-K18-006 Dec. 18 14:15 14:50 Naho ITAGAKi Graduate School of Information Science and Electrical Engineering Sputter Epitaxy of Compound Semiconductors via Inverse Stranski-Krastanov Mode: A Method of Single-Crystalline Film Growth beyond Lattice Matching Condition
3001   Invited   C3-I18-007 Dec. 18 14:50 15:15 Kosuke TAKENAKA Joining and Welding Research Institute, Osaka University Formation of Functional Thin Films at Low Temperature using Plasma-assisted Reactive Processes
2483   Invited   C3-I18-008 Dec. 18 15:15 15:40 *G Minkyu SON International Institute for Carbon-Neutral Energy Research (I2CNER), Kyushu University Photoelectrochemical Photocathodes Assisted with Plasma Sputtering Deposition for Solar-driven Water Splitting
2844   Invited   C3-I18-009 Dec. 18 15:40 16:05 Hyunwoong SEO Department of Energy Engineering, Inje University Nano-materials for the electro-catalytic activation
Dec. 19
9:00 - 12:25
北九州国際会議場　21会議室C,D （D会場）
Kitakyushu International Conference Center Room 21C,D
Chair :
酒井 道 (滋賀県立大学)
Osamu SAKAI (The University of Shiga Prefecture)
2041   Invited   C3-I19-001 Dec. 19 09:00 09:25 Shota NUNOMURA National Institute of Advanced Industrial Science and Technology(AIST) Defect kinetics in high-efficiency silicon heterojunction solar cells
2132   Invited   C3-I19-002 Dec. 19 09:25 09:50 Hirsohi UMISHIO Research center for photovoltaics, National institute of Advanced Industrial Science and Technology Liquid-phase-crystallized silicon films on glass fabricated from amorphous silicon-based precursors deposited by plasma-enhanced CVD and their application to photovoltaics
3080   Invited   C3-I19-003 Dec. 19 09:50 10:15 Heeyeop CHAE SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University (SKKU)/School of Chemical Engineering, Sungkyunkwan University (SKKU) Atomic Layer Etching for Surface Cleaning of Native Oxide
   Break Dec. 19 10:15 10:30
2766   Invited   C3-I19-004 Dec. 19 10:30 10:55 Yoshiyuki SUDA Toyohashi University of Technology Electric resistivity measurement of single carbon nanocoils using focused ion beam technique
2666   Invited   C3-I19-005 Dec. 19 10:55 11:20 Takayoshi Tsutsumi Nagoya university Trimming Process with Feedback Control of Wafer Temperature for Organic Material
2559     C3-O19-006 Dec. 19 11:20 11:35 *D Noritaka SAKAKIBARA Graduate School of Frontier Sciences, The University of Tokyo/Advanced Operando-Measurement Technology Open Innovation Laboratory (OPERANDO-OIL), National Institute of Advanced Industrial Science and Technology Soft X-ray Spectroscopy of Plasma-treated Carbon Nanotubes Dispersed in Solution
2664   Invited   C3-I19-007 Dec. 19 11:35 12:00 Haruka SUZUKI Nagoya University Water Vapor Plasma Treatment Process using Slot-Excited Microwave Plasma
2776   Invited   C3-I19-008 Dec. 19 12:00 12:25 Yoshiki SHIMIZU National Institute of Advanced Industrial Science and Technology (AIST) A simple method to synthesize nanoparticles via metal target etching using an atmospheric plasma and its application to fabrication of functional nanocomposite film
Dec. 19
14:15 - 17:10
北九州国際会議場　21会議室C,D （D会場）
Kitakyushu International Conference Center Room 21C,D
Chair :
清水 禎樹 (産業技術総合研究所)
Yoshiki SHIMIZU (National Institute of Advanced Industrial Science and Technology
2523   Invited   C3-I19-009 Dec. 19 14:15 14:40 Makoto Kambara Graduate School of Engineering, The University of Tokyo Continuous growth of silicon rod by modified VLS during combined plasma spraying
2982   Invited   C3-I19-010 Dec. 19 14:40 15:05 *G Wei-Hung Chiang National Taiwan University of Science and Technology Nanostructure Engineering using Microplasmas toward Functional Nanomterials Synthesis and Applications
2565     C3-O19-011 Dec. 19 15:05 15:20 Jaeho KIM National Institute of Advanced Industrial Science and Technology (AIST) Low-temperature synthesis of high-quality graphene films by a blowing type of microwave-excited plasma CVD
2996     C3-O19-012 Dec. 19 15:20 15:35 *M Noritada OGURA Tohoku University Fabrication of High Performance Graphene Nanoribbon Transistors by Advanced Plasma CVD
   Break Dec. 19 15:35 15:50
2833   Invited   C3-I19-013 Dec. 19 15:50 16:15 Shinji Kambara Graduate School of Engineering, Gifu University Development of Plasma Membrane Reactor for Hydrogen Production from Ammonia
3045   Invited   C3-I19-014 Dec. 19 16:15 16:40 *G Susumu Toko The University of Tokyo Methanation of CO2 using plasma in Martian atmospheric pressure and temperature
2932     C3-O19-015 Dec. 19 16:40 16:55 *G Yukio HAYAKAWA Gifu university Development of Plate Type Plasma Reactor With a Flow Channel
2940     C3-O19-016 Dec. 19 16:55 17:10 *M Jing LYU Graduate School of Engineering, Tohoku University Effects of Electron Energy on Generation of High-Energy Ions via Sheath: Analysis by Particle-in-cell Method Simulation
Dec. 20
9:00 - 11:40
北九州国際会議場　21会議室C,D （D会場）
Kitakyushu International Conference Center Room 21C,D
Chair :
堤 隆嘉 (名古屋大学)
Takayoshi Tsutsumi (Nagoya university)
2943   Keynote   C3-K20-001 Dec. 20 09:00 09:35 Mineo HIRAMATSU Faculty of Science and Technology, Meijo University Plasma Processing for Carbon-Based Nanostructures
2958   Invited   C3-I20-002 Dec. 20 09:35 10:00 Hiroshi FURUTA School of Systems Engineering, Kochi University of Technology/Center for Nanotechnology, Research Institute, Kochi University of Technology Nano carbon structures for Metamaterials
2976   Invited   C3-I20-003 Dec. 20 10:00 10:25 HIROYUKI Kousaka Gifu University Promotion of running-in process in sliding of diamond-Like carbon coatings by using atmospheric plasma irradiation during sliding
   Break Dec. 20 10:25 10:40
2902     C3-O20-004 Dec. 20 10:40 10:55 Yasunori TANAKA Faculty of Electrical and Computer Engineering, Kanazawa University Influence of Alternating Gas Injection on the Temperature Field in Reaction Chamber for Nanoparticle Synthesis using Inductively Coupled Thermal Plasmas
2698     C3-O20-005 Dec. 20 10:55 11:10 *M Cinthya Soreli CASTRO ISSASI Graduate School of Science and Technology, Kumamoto University Rapid Synthesis of Thermo-Sensitive Polymer Through Pulsed Arc Discharge
2886     C3-O20-006 Dec. 20 11:10 11:25 *M Ryo HAMAJI Nagoya University Fe-N-C bonds in carbon nanoflakes grown by plasma of ethanol and iron phthalocyanine
2995     C3-O20-007 Dec. 20 11:25 11:40 *M Tomoya KAMEYAMA Tohoku University Integrated Synthesis of Layer Number Controlled WS2 by Au Dot Technology